Spectroscopic Studies of Magnetron Sputtering Plasma Discharge in Cu/O2/Ar Mixture for Copper Oxide Thin Film Fabrication. Jurnal Teknologi, [S. l.], v. 73, n. 1, 2015. DOI: 10.11113/jt.v73.2984. Disponível em: https://journals.utm.my/jurnalteknologi/article/view/2984.. Acesso em: 23 jul. 2024.