VHF-PECVD FABRICATION PARAMETERS DEPENDENT MORPHOLOGY VARIATION OF GOLD CATALYST ASSISTED SILICON THIN FILM GROWTH. Jurnal Teknologi, [S. l.], v. 76, n. 13, 2015. DOI: 10.11113/jt.v76.5831. Disponível em: https://journals.utm.my/jurnalteknologi/article/view/5831.. Acesso em: 23 jul. 2024.