EFFECT OF ETCHING TIME ON OPTICAL AND MORPHOLOGICAL FEATURES OF N-TYPE POROUS SILICON PREPARED BY PHOTO-ELECTROCHEMICAL METHOD. Jurnal Teknologi, [S. l.], v. 78, n. 3, 2016. DOI: 10.11113/jt.v78.7465. Disponível em: https://journals.utm.my/jurnalteknologi/article/view/7465.. Acesso em: 20 may. 2024.