FABRICATION OF CARBON THIN FILMS BY PULSED LASER DEPOSITION IN DIFFERENT AMBIENT ENVIRONMENTS

Authors

  • Mohamad Helmi Abd Mubin Laser Center, Ibnu Sina Institute for Scientific & Industrial Research (ISI-SIR), Universiti Teknologi Malaysia, 81310 UTM Johor Bahru, Johor, Malaysia
  • Muhammad Sufi Roslan Laser Center, Ibnu Sina Institute for Scientific & Industrial Research (ISI-SIR), Universiti Teknologi Malaysia, 81310 UTM Johor Bahru, Johor, Malaysia
  • Syed Zuhaib Haider Rizvi Laser Center, Ibnu Sina Institute for Scientific & Industrial Research (ISI-SIR), Universiti Teknologi Malaysia, 81310 UTM Johor Bahru, Johor, Malaysia
  • Kashif Chaudhary Physics Department, Faculty of Science, Universiti Teknologi Malaysia, 81310 UTM Johor Bahru, Johor, Malaysia
  • Suzairi Daud Physics Department, Faculty of Science, Universiti Teknologi Malaysia, 81310 UTM Johor Bahru, Johor, Malaysia
  • Jalil Ali Physics Department, Faculty of Science, Universiti Teknologi Malaysia, 81310 UTM Johor Bahru, Johor, Malaysia
  • Yusof Munajat Physics Department, Faculty of Science, Universiti Teknologi Malaysia, 81310 UTM Johor Bahru, Johor, Malaysia

DOI:

https://doi.org/10.11113/jt.v78.7506

Keywords:

Pulsed Laser Deposition, Nd, YAG Laser, carbon thin film

Abstract

In this work, carbon thin films are grown in different background environments (Air, Helium and Argon) at different pressures (60, 160, 500 and 1000 mbar) by ablating the graphite target with Nd:YAG laser of wavelength of 1064 nm, pulse energy of 740 mJ and pulse rate of 6 ns. 10,000 laser shots are used to ablate graphite target under different ambient conditions. Grown thin films are analyzed by Atomic Force Microscopy (AFM) to measure thickness, roughness average, maximum profile peak height, average maximum height of profile and spacing ratio of the surface. The obtained results show that the roughness average, thickness of film, maximum profile peak height, average maximum height of profile and spacing ratio of thin films decreases with increase in ambient pressuresand shows highest value at low pressure (160 mbar) in helium environment as compared with air and argon.

References

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Published

2016-02-21

Issue

Section

Science and Engineering

How to Cite

FABRICATION OF CARBON THIN FILMS BY PULSED LASER DEPOSITION IN DIFFERENT AMBIENT ENVIRONMENTS. (2016). Jurnal Teknologi, 78(3). https://doi.org/10.11113/jt.v78.7506