NUMERICAL STUDIES OF ION BEAM IN NX2 PLASMA FOCUS FOR DIFFERENT APPLIED VOLTAGE
DOI:
https://doi.org/10.11113/jt.v78.7828Keywords:
Plasma focus, applied voltage, focusing phaseAbstract
Plasma focus device gives simultaneous interaction between magnetic and electric field which results in exhibiting multi-radiation properties. Ion beam radiates from the system is significant for experimenting target material of interest in plasma focus research. Lee code model is used to simulate the numerical experiments on NX2-plasma focus device system using different applied voltage in the range 10 to 14 kV. The system is operating in Neon filled at an optimum pressure depending on the applied voltage used in the experiment. Results obtained are analysed and fitted with the experimental results for system validation. Good fitting on the numerical with the experimental results is obtained by incorporating mass shedding effects and current shedding factor. The range of current density obtained is in the range 1.6x108 to 7.3x109 Am-2 whilst the maximum ion beam energy is estimated to be 156 JReferences
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