RF ATTENUATION CALIBRATION SYSTEM IN THE FREQUENCY RANGE OF 9 KHZ TO 10 MHZ

Authors

  • Anton Widarta National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology, NMIJ/AIST, Tsukuba, Japan

DOI:

https://doi.org/10.11113/jt.v78.8768

Keywords:

RF attenuation, resistive attenuator, EMC, standard, traceability

Abstract

An accurate RF attenuation calibration system in the frequency range of 9 kHz to 10 MHz is developed at NMIJ, to meet the demand in recent EMC regulations that require traceability of measurements to national standard. The system works based on the RF substitution technique, in which a resistive step-attenuator is used as a reference standard and a general-purpose receiver as a precision level detector. Attenuation values of the standard are determined by calibration at single frequency, i.e., 1 MHz using the NMIJ Primary Attenuation Standard system based on the voltage ratio of the IVD.  The system is very simple and higher dynamic range (>100 dB) is obtained by introducing toroidal ferrite chokes in the circuit to minimize the common mode current effects.  

References

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Alan Coster, A. 2007. Attenuation Measurement. In Richard Collier and Dough Skinner (ed) Microwave Measurements 3rd edition. London: Institution of Engineering and Technology.

Widarta, A. 2014. Establishment of RF Attenuation Standard in the Frequency Range of 30 GHz to 50 GHz at NMIJ. 2(2): 1-7.

Widarta, A. 2008. Simple and Accurate Radio Frequency Attenuation Measurements using General-purpose Receiver. ICEE 2008, 2(1): 1-8.

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Widarta, A. and Kawakami, T. 2003. Attenuation Measurement System in the Frequency Range of 10 to 100 MHz. IEEE Trans. Instrum. Meas. 52(2): 302-305.

Widarta, A. 2102. Double Step Attenuation Measurement Technique for High Attenuation of Variable Attenuators. CPEM 2012, Washington DC. 1(3): 1-6.

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Published

2016-05-25

Issue

Section

Science and Engineering

How to Cite

RF ATTENUATION CALIBRATION SYSTEM IN THE FREQUENCY RANGE OF 9 KHZ TO 10 MHZ. (2016). Jurnal Teknologi, 78(5-8). https://doi.org/10.11113/jt.v78.8768