INFLUENCES OF DEPOSITION TIME ON TIO2 THIN FILMS PROPERTIES PREPARED BY CVD TECHNIQUE
DOI:
https://doi.org/10.11113/jt.v78.9754Keywords:
Titanium dioxide, CVD technique, deposition timeAbstract
Titanium dioxide (TiO2) is known as a material with exceptionally good optical, mechanical and thermal properties. An increasing interest has been devoted to the study of TiO2 because of their numerous applications in various industries. In this study, by controlling process parameters, TiO2 thin films were successfully deposited on a glass substrate using chemical vapor deposition (CVD) technique. It has been fabricated using two source materials that are 99.9 % pure titanium and graphite powder at 1000 °C annealing temperature. The deposition time were observed at 1 hour, 2 hours and 3 hours. The TiO2 thin films properties were characterized using X-Ray Diffraction (XRD), Atomic Force Microscope (AFM), Ultraviolet-Visible Spectroscopy (UV-Vis), Surface Profilometer (SP) and Current-Voltage (I-V) Measurement Tools. Based on XRD results, the intensity of mixed anatase, rutile, cotunnite type and TiO2 was highest for 3 hours deposition time. AFM images reveal the crystalline morphology with average grain size of 151.662 nm. The band gap energy obtained from UV-Vis as well as thicknesses gained from SP and resistivity acquired from Current-Voltage (I-V) Measurement of deposited TiO2 thin films were increasing with deposition time. It is vice versa for the conductivity of deposited TiO2 thin films that is declining with increasing of deposition time. It can be concluded from the experimental results that the deposition time affects the TiO2 thin films properties.
References
Lee, S.H., Yang, Y. S., Chen, H.L., Tsai, C.C. and Chuang C.S. 2008. Properties of TiO2/SnO2 Co-Deposited Thin Films Deposited by Radio Frequency Sputtering. Thin Films. 1-9.
Aksoy, S. and Caglar, S. 2014. Structural Transformations of TiO2 Films with Deposition Temperature and Electrical Properties of Nanostructure n-TiO2/p-Si Heterojunction Diode. Journal of Alloys and Compounds. 613: 330-337.
Hanaor, D.H.A and Sorrell, C.C. 2011. Review of the Anatase to Rutile Phase Transformation. Journal of Materials Science. 46: 855-874.
Dubrovinsky, L.S., Dubrovinskaia, N.A., Swamy, V., Muscat, J., Harrison, N.M., Ahuja, R. and Holm, B. 2009. Cotunnite-Structured Titanium Dioxide: The Hardest Known Oxide. 2009. 1-18.
Khalifa Z.S., Lin, H. and Shah, S.I. 2010, Structural and Electrochromic Properties of TiO2 Thin Films Prepared by Metallorganic Chemical Vapour Deposition. Thin Solid Films. 518: 5457-5462.
Kaariainen, M.L., Kaariainen, T.O. and Cameron, D.C. 2009. Titanium Dioxide Thin Films, Their Structure and Its Effect on Their Photoactivity and Photocatalyic Properties. Thin Solid Films. 517: 6666-6670.
Nguu, J.N., Musembi, R.J, Nyongesa, F.W. and Aduda, B.O. 2014. Effect of Process-Related Parameters on Band Gap of Electrophoretically Deposited TiO2/Nb2O5 Composite Thin Films. Africa Journal of Physical Sciences. 1: 43-49.
Senain, I., Nayan, N. and Saim, H. 2010. Structural and Electrical Properties of TiO2 Thin Film Derived from Sol-Gel Method using Titanium (IV) Butoxide. International Journal of Integrated Engineering. 3(4): 29-35.
Wei, C.H. and Chang, C.M. 2011. Polycrystalline TiO2 Thin Films with Different Thickness Deposited on Unheated Substrates Using RF Magnetron Sputtering. Materials Transaction. 52 (3): 554-559.
Rahim, M.S, Sahdan, M.Z. and Lias, J. 2015. Uniform Deposition of Titanium Dioxide Films by Chemical Vapor Deposition (CVD). Applied Mechanics and Materials. 773-774: 744-748.
Mohamed, F.N., Rahim, M.S.A., Nayan, N., Ahmad, M.K., Sahdan, M.Z. and Lias, J. 2015. Influence of TiO2 Thin Film Annealing Temperature on Electrical Properties Synthesized by CVD Technique. ARPN Journal of Engineering and Applied Sciences.10(19): 8678-8683.
Besserguenev, V.G, Pereira, R. J. F., Mateus, M. C., Khmelinskii, I. V., Nicula, R. C. and Burkel, E. 2003. TiO2 Thin Film Synthesis from Complex Precursors by CVD, Its Physical and Photocatalyic Properties. International Journal of Photoenergy. 5: 99-105.
Hocine, D., Pasquinelli, M., Escoubas, L., Torchio, P., Moreau, A. and Belkaid, M.S. 2010. Structural and Optical Study of Titanium Dioxide Thin Films Elaborated by APCVD for Application in Silicon Solar Cells. International Conference on Renewable Energies and Power Quality (ICREPQ’10). 1-6.
Paul, M., Paliwal, A., Dubey, R., Sharma, V. K. and Kant, C. 2014. Kinetic Studies of Nano-Crystalline TiO2 Thin Films on Glass Substrate by Dip Coating Process. International Journal of Electronic and Electrical Engineering. 7(2): 135-142.
Masuda, Y., Jinbo, Y. and Koumoto, K. 2009. Room Temperature CVD of TiO2 Thin Films and Their Electronic Properties. Science of Advanced Materials 1: 138-143.
Ivanova, A.R., Nuesca, G., Xiaomwng Chen, X., Goldberg, C., Kaloyeros, A.E., Arkles, B. and Sullivan, J.J. 1999. The Effects of Processing Parameters in the Chemical Vapor Deposition of Cobalt Tricarbonyl Nitrosyl. Journal of The Electrochemical Society. 146(6): 2139-2145.
Md Sin, N. D., Kamaruddin, S. A., Musa, M. Z., Rusop, M. 2011. Effect of Deposition Time SnO2 Thin Film Deposited using Thermal CVD for Humidity Sensor Application. 2011 IEEE Symposium on Industrial Electronics and Applications (ISIEA2011). 459-462
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