VHF-PECVD FABRICATION PARAMETERS DEPENDENT MORPHOLOGYVARIATION OF GOLD CATALYST ASSISTED SILICON THIN FILM GROWTH. Jurnal Teknologi, [S. l.], v. 76, n. 1, 2015. DOI: 10.11113/jt.v76.4030. Disponível em: https://journals.utm.my/jurnalteknologi/article/view/4030.. Acesso em: 18 aug. 2024.