NUMERICAL STUDIES OF ION BEAM IN NX2 PLASMA FOCUS FOR DIFFERENT APPLIED VOLTAGE. Jurnal Teknologi, [S. l.], v. 78, n. 3-2, 2016. DOI: 10.11113/jt.v78.7828. Disponível em: https://journals.utm.my/jurnalteknologi/article/view/7828.. Acesso em: 23 jul. 2024.