Carbonization Layer Grown By Acetylene Reaction On Si(100) And (111) Surface Using Low Pressure Chemical Vapor Deposition. Jurnal Teknologi, [S. l.], v. 50, n. 1, p. 23–32, 2012. DOI: 10.11113/jt.v50.164. Disponível em: https://journals.utm.my/jurnalteknologi/article/view/164.. Acesso em: 23 jul. 2024.