INFLUENCES OF DEPOSITION TIME ON TIO2 THIN FILMS PROPERTIES PREPARED BY CVD TECHNIQUE. Jurnal Teknologi, [S. l.], v. 78, n. 10-3, 2016. DOI: 10.11113/jt.v78.9754. Disponível em: https://journals.utm.my/jurnalteknologi/article/view/9754.. Acesso em: 23 jul. 2024.