OPTIMIZATION OF PROCESS PARAMETERS FOR GOLD-DOPED SILICON IN RF APPLICATION. Jurnal Teknologi (Sciences & Engineering), [S. l.], v. 87, n. 6, p. 1143–1151, 2025. DOI: 10.11113/jurnalteknologi.v87.23462. Disponível em: https://journals.utm.my/jurnalteknologi/article/view/23462.. Acesso em: 6 dec. 2025.